Diederik Depla

About

DRAFT (Dedicated Research on Advanced Films and Targets) focuses on research related to thin film growth through reactive magnetron sputter deposition. The work involves both experimental and modeling approaches to understand the processes involved in thin film technology. This research is crucial for advancements in various applications, including electronics and materials science. The team at DRAFT is committed to pushing the boundaries of knowledge in solid state sciences. By integrating innovative techniques and methodologies, they aim to contribute significantly to the field. Their mission is to provide high-quality research outputs that can be utilized in both academic and industrial settings.

Publications

The role of backscattered neutrals on the phase composition of sputter deposited tungsten thin films
Applied Surface Science
2026
Further evidence for double hysteresis behavior during reactive magnetron sputtering
Surface and Coatings Technology
2026
Growth mechanisms and mechanical response of 3D superstructured cubic and hexagonal Hf1-xAlxN thin films
Acta Materialia
2026
Convergence during feedback controlled reactive magnetron sputtering: Mechanisms and classification
Surface and Coatings Technology
2025
Floating potential probes for process control during reactive magnetron sputtering
Surface and Coatings Technology
2024
Note on the low deposition rate during reactive magnetron sputtering
Vacuum
2024
Phase composition of sputter deposited tungsten thin films
Surface and Coatings Technology
2024
Calculation of oxide sputter yields
Vacuum
2024
On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering
Vacuum
2023
Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering
Applied Surface Science
2023
Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions
Acta Materialia
2023
Effect of Growth Temperature and Atmosphere Exposure Time on Impurity Incorporation in Sputtered Mg, Al, and Ca Thin Films
Materials
2023
Chemical Stability of Sputter Deposited Silver Thin Films
Coatings
2022
A computational study of the double hysteresis phenomenon during reactive sputtering
Journal of Physics D: Applied Physics
2022
Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
2021
Influence of Impurities on the Front Velocity of Sputter Deposited Al/CuO Thermite Multilayers
Materials
2021
Understanding residual stress in thin films: Analyzing wafer curvature measurements for Ag, Cu, Ni, Fe, Ti, and Cr with a kinetic model
Journal of Applied Physics
2021
Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures
Thin Solid Films
2021
On the grain size-thickness correlation for thin films
Acta Materialia
2021
Sputter Deposited Metal Layers Embedded in Composites—From Fundamentals to Applications
Coatings
2021
Sputter deposition with powder targets: An overview
Vacuum
2021
On the electrical properties of sputter deposited thin films: The role of energy and impurity flux
Thin Solid Films
2019
On the microstructure of magnesium thin films deposited by magnetron sputtering
Thin Solid Films
2019
Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures
Surface and Coatings Technology
2019
Modeling reactive magnetron sputtering: Opportunities and challenges
Thin Solid Films
2019
Sputter deposition of copper oxide films
Applied Surface Science
2019
The Seebeck Coefficient of Sputter Deposited Metallic Thin Films: The Role of Process Conditions
Coatings
2019
On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films
Surface and Coatings Technology
2019
Reactive sputter deposition of CoCrCuFeNi in nitrogen/argon mixtures
Journal of Alloys and Compounds
2018
Impurity dominated thin film growth
Applied Physics Letters
2018
The effect of energy and momentum transfer during magnetron sputter deposition of yttrium oxide thin films
Applied Surface Science
2018
Anomalous effects in the aluminum oxide sputtering yield
Journal of Physics D: Applied Physics
2018
The nanostructure and mechanical properties of nanocomposite Nbx-CoCrCuFeNi thin films
Scripta Materialia
2017
The existence of a double S-shaped process curve during reactive magnetron sputtering
Applied Physics Letters
2016

Experience

Ghent University

Professor / 19992017

Links & Social Media

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