Fort Hill

Applied Math Solutions, LLC

Research Expertise

Physics
Quantum Field Theory
Mathematics
Applied Mathematics
Nanofabrication

Legacy Map

Full View

Publications

Resist blur and line edge roughness
Optical Microlithography XVIII
2005
Ranging and velocimetry signal generation in a backscatter-modulated laser diode
Applied Optics
1988
Nanomanufacturing: A Perspective
ACS Nano
2016
How a US Patent Protects You, and Does Your Project Qualify for a US Patent?
World Patent Information
1997
Lithography, metrology and nanomanufacturing
Nanoscale
2011
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
2004
Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling
Optics Express
2008
Laser focusing of atomic beams
Journal of the Optical Society of America B
1991
Surface-emitting distributed feedback semiconductor laser
Applied Physics Letters
1987
Extendibility of chemically amplified resists: another brick wall?
SPIE Proceedings
2003
Fast calculation of images for high numerical aperture lithography
SPIE Proceedings
2004
<title>Micrascan adaptive x-cross correlative independent off-axis modular (AXIOM) alignment system</title>
SPIE Proceedings
1996
Fundamental limits to EUV photoresist
SPIE Proceedings
2007
Gallatin, Albert
Oxford Art Online
2009
Resolution, LER, and sensitivity limitations of photoresists
SPIE Proceedings
2008
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
Applied Optics
2003
Backscatter-modulation velocimetry with an external-cavity laser diode
Optics Letters
1989
Nanomanufacturing with DNA Origami: Factors Affecting the Kinetics and Yield of Quantum Dot Binding
Advanced Functional Materials
2012
Design and test of a through-the-mask alignment sensor for a vertical stage x-ray aligner
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
1994
Propagation of vortex electron wave functions in a magnetic field
Physical Review A
2012
Extending Arc Heater Operating Pressure Range for Improved Reentry Simulation
25th AIAA Aerodynamic Measurement Technology and Ground Testing Conference
2006
Resist Requirements and Limitations for Nanoscale Electron-Beam Patterning
MRS Proceedings
2002
Modeling Line Edge Roughness in Templated, Lamellar Block Copolymer Systems
Macromolecules
2012
Laser feedback metrology of optical systems
Applied Optics
1989
Quantum dot-DNA origami binding: a single particle, 3D, real-time tracking study
Chem. Commun.
2013
New paradigm in lens metrology for lithographic scanner: evaluation and exploration
SPIE Proceedings
2004
Spatial scaling metrics of mask-induced line-edge roughness
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
2008
Web sites for patent information centers: the US experience
World Patent Information
2001
Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
2003
Backscatter-Modulation Semiconductor Laser Radar
SPIE Proceedings
1989
Rapid, noncontact optical figuring of aspheric surfaces with plasma-assisted chemical etching
SPIE Proceedings
1990
Film quantum yields of EUV and ultra-high PAG photoresists
SPIE Proceedings
2008
Relative importance of various stochastic terms and EUV patterning
Journal of Micro/Nanolithography, MEMS, and MOEMS
2018
Efficiency enhancement of copper contaminated radial p–n junction solar cells
Chemical Physics Letters
2011
Unified approach to the temporal evolution of surface profiles in solid etch and deposition processes
Journal of Applied Physics
1989
Chemical flare long-range proximity effects in photomask manufacturing with chemically amplified resists
SPIE Proceedings
2006
Estimated impact of shot noise in extreme-ultraviolet lithography
SPIE Proceedings
2003
Continuum model of shot noise and line edge roughness
SPIE Proceedings
2001
Impact of thin resist processes on post-etch LER
SPIE Proceedings
2003
Restructuring Reserve Compensation
Filling the Ranks
2004
High-numerical-aperture scalar imaging
Applied Optics
2001
EUV photoresist performance results from the VNL and the EUV LLC
SPIE Proceedings
2002
Ranging and velocimetry signal generation in a backscatter-modulated laser diode
Annual Meeting Optical Society of America
1988
Three-Dimensional Imaging Coherent Laser Radar Array
Optical Engineering
1989
Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
2010
Modeling the transfer of line edge roughness from an EUV mask to the wafer
SPIE Proceedings
2011
Antenna design for long range 13.56 MHz RFID reader
IET International Conference on Wireless Mobile and Multimedia Networks Proceedings (ICWMMN 2006)
2006
<title>Micrascan III: 0.25-um resolution step-and-scan system</title>
SPIE Proceedings
1996
Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
2001
Modeling the effects of acid amplifiers on photoresist stochastics
SPIE Proceedings
2012
Residual speckle in a lithographic illumination system
Journal of Micro/Nanolithography, MEMS, and MOEMS
2009
Analytical model of the “Shot Noise” effect in photoresist
Microelectronic Engineering
1999
Line end optimization through optical proximity correction (OPC): a case study
SPIE Proceedings
2006
Finite element analysis of SCALPEL wafer heating
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
1999
Optimal laser scan path for localizing a fluorescent particle in two or three dimensions
Optics Express
2012
Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node
SPIE Proceedings
2002
Scattering matrices for imaging layered media
Journal of the Optical Society of America A
1988
Modeling The Images Of Alignment Marks Under Photoresist
SPIE Proceedings
1987
Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
2008
Fast approximation of transfer cross coefficient for optical proximity correction
Optics Express
2008
An Innovative Prefabricated Pile Installation Method Utilizing Jetting and Pressure Grouting
GeoFlorida 2010
2010
Lithography and Chemical Modeling of Acid Amplifiers for Use in EUV Photoresists
Journal of Photopolymer Science and Technology
2011
Space-charge results from the SCALPEL proof-of-concept system
SPIE Proceedings
1999
CMOS compatible alignment marks for the SCALPEL proof of lithography tool
Microelectronic Engineering
1999
Topics in polarization ray tracing for image projectors
SPIE Proceedings
2005
Analytical-based solutions for SCALPEL wafer heating
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
2000
Analytic evaluation of the intensity point spread function
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
2000
Overlay error budgets for a high-throughput SCALPEL system
SPIE Proceedings
1999
Alignment mark detection in CMOS materials with SCALPEL e-beam lithography
SPIE Proceedings
1999
A useful formula for evaluating commutators
Journal of Mathematical Physics
1983
Pairing-induced spatially extended coherence of low-lying vibrational excitations unique in neutron drip line nuclei
Physica Scripta
2006
Initial wafer heating analysis for a SCALPEL lithography system
Microelectronic Engineering
1999
<title>Micrascan II overlay error analysis</title>
SPIE Proceedings
1994
On zeta function regularization for operators with continuous spectra
Journal of Mathematical Physics
1984
Response of Block Copolymer Thin-Film Morphology to Line-Width Roughness on a Chemoepitaxial Template
Macromolecules
2014
Modeling line-edge roughness in lamellar block copolymer systems
SPIE Proceedings
2012
SCALPEL aerial image monitoring: Principles and application to space charge
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
2000
Compact Imaging System With Ranging And Velocimetry
SPIE Proceedings
1989
Properties And Applications Of Layered Grating Resonances
SPIE Proceedings
1987
Mask-membrane impact on image blur in SCALPEL
Microelectronic Engineering
2001
Alignment and Overlay
Microlithography
2020
Functional-integral representation of rough surfaces
Journal of the Optical Society of America A
1991
AlGaAs Surface Emitting Distributed Feedback Laser
SPIE Proceedings
1988
The Simultaneous Use of Multiple Reference Points in Risky Decision Making
PsycEXTRA Dataset
2008
Predicted Polishing Behavior Of Plasma Assisted Chemical Etching (PACE) From A Unified Model Of The Temporal Evolution Of Etched Surfaces
SPIE Proceedings
1989
Confidence Bands for One Multiple Regression Model
Simultaneous Inference in Regression
2010
Assessing the impact of intrinsic birefringence on 157-nm lithography
SPIE Proceedings
2004
Thermal distortion predictions of a silicon wafer during exposure in a SCALPEL tool
Microelectronic Engineering
2000
Marks for SCALPEL® tool optics optimization
Microelectronic Engineering
2000
Laser Radar Array Used For Improving Image Analysis Algorithms
SPIE Proceedings
1989
Block-copolymer healing of simple defects in a chemoepitaxial template
SPIE Proceedings
2013

Links & Social Media

Join Fort on NotedSource!
Join Now

At NotedSource, we believe that professors, post-docs, scientists and other researchers have deep, untapped knowledge and expertise that can be leveraged to drive innovation within companies. NotedSource is committed to bridging the gap between academia and industry by providing a platform for collaboration with industry and networking with other researchers.

For industry, NotedSource identifies the right academic experts in 24 hours to help organizations build and grow. With a platform of thousands of knowledgeable PhDs, scientists, and industry experts, NotedSource makes connecting and collaborating easy.

For academic researchers such as professors, post-docs, and Ph.D.s, NotedSource provides tools to discover and connect to your colleagues with messaging and news feeds, in addition to the opportunity to be paid for your collaboration with vetted partners.

Expert Institutions
NotedSource has experts from Stanford University
Expert institutions using NotedSource include Oxfort University
Experts from McGill have used NotedSource to share their expertise
University of Chicago experts have used NotedSource
MIT researchers have used NotedSource
Proudly trusted by
Microsoft uses NotedSource for academic partnerships
Johnson & Johnson academic research projects on NotedSource
ProQuest (Clarivate) uses NotedSource as their industry academia platform
Slamom consulting engages academics for research collaboration on NotedSource
Omnicom and OMG find academics on notedsource
Unilever research project have used NotedSource to engage academic experts

Connect with researchers and scientists like Fort Hill on NotedSource to help your company with innovation, research, R&D, L&D, and more.